| CPC H01J 37/32963 (2013.01) [H01J 37/32972 (2013.01); H01J 37/3299 (2013.01)] | 13 Claims |

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1. A system to remotely monitor a plasma, the system comprising: an electromagnetic antenna positioned outside a plasma chamber; a spectrum analyzer coupled to the electromagnetic antenna which measures a plurality of signals received by the electromagnetic antenna to determine whether the electromagnetic antenna is detecting a near electromagnetic field signal from a plasma source in the plasma chamber, said determination being made by measuring fall-off of the signals received as a function of distance from the plasma chamber such that a measurement of a signal which falls-off at a rate of 1/r3 denotes a measurement of a near electromagnetic field signal; the antenna is positioned in proximity to a non-conduction external access port to detect the near electromagnetic field signal of the plasma source in the plasma chamber, and the spectrum analyzer is configured to analyze low power signal levels across a wide frequency band.
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