| CPC G03F 7/70858 (2013.01) [B01D 53/0407 (2013.01); B01D 53/30 (2013.01); C23C 16/4412 (2013.01); B01D 2257/108 (2013.01); B01D 2257/553 (2013.01); B01D 2257/93 (2013.01); B01D 2258/0216 (2013.01)] | 20 Claims |

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1. An exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas, comprising:
a main exhaust pipe positioned above the semiconductor manufacturing equipment and having a top surface on a first side of the main exhaust pipe and a bottom surface on a second side of the main exhaust pipe;
a first branch pipe connected to a source of a gas mixture containing the hazardous gas on the second side of the main exhaust pipe and connected to the main exhaust pipe through the top surface;
a second branch pipe connected to a gas box on the second side of the main exhaust pipe and connected to the main exhaust pipe through the bottom surface; and
a detector on the second branch pipe configured to detect presence of the hazardous gas and downstream to the gas box,
wherein the first branch pipe is connected to the main exhaust pipe at a first location, the second branch pipe is connected to the main exhaust pipe at a second location, and
wherein the first location is more upstream than the second location.
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