	US 12,276,913 B2
	Organotin oxide hydroxide patterning compositions, precursors, and patterning
Stephen T. Meyers, Corvallis, OR (US); Jeremy T. Anderson, Corvallis, OR (US); Brian J. Cardineau, Corvallis, OR (US); Joseph B. Edson, Corvallis, OR (US); Kai Jiang, Corvallis, OR (US); Douglas A. Keszler, Corvallis, OR (US); and Alan J. Telecky, Albany, OR (US)
Assigned to Inpria Corporation, Corvallis, OR (US)
Filed by Inpria Corporation, Corvallis, OR (US)
Filed on Jul. 6, 2022, as Appl. No. 17/858,172.
Application 17/858,172 is a continuation of application No. 17/832,920, filed on Jun. 6, 2022, granted, now 11,809,081.
Application 17/832,920 is a continuation of application No. 16/987,120, filed on Aug. 6, 2020, granted, now 11,537,048.
Application 16/987,120 is a continuation of application No. 16/238,779, filed on Jan. 3, 2019, granted, now 10,775,696, issued on Sep. 15, 2020.
Application 16/238,779 is a continuation of application No. 15/291,738, filed on Oct. 12, 2016, granted, now 10,228,618, issued on Mar. 12, 2019.
Claims priority of provisional application 62/297,540, filed on Feb. 19, 2016.
Claims priority of provisional application 62/240,812, filed on Oct. 13, 2015.
Prior Publication US 2022/0334488 A1, Oct. 20, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/16 (2006.01); C23C 14/08 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01)

CPC G03F 7/168 (2013.01) [C23C 14/086 (2013.01); C23C 16/407 (2013.01); C23C 16/45523 (2013.01); C23C 16/45561 (2013.01); G03F 7/0042 (2013.01); G03F 7/0043 (2013.01); G03F 7/162 (2013.01); G03F 7/167 (2013.01); G03F 7/2004 (2013.01); G03F 7/30 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01)]

28 Claims

1. A method for forming a radiation patternable organometallic film comprising an oxo-hydroxo network with metal cations having organic ligands with metal carbon bonds and metal oxygen bonds, the method comprising:

inputting into a deposition chamber closed from the ambient atmosphere a first precursor vapor comprising a first organotin composition represented by the formula R_nSnX_4-nwherein R is an organic ligand with 1-31 carbon atoms bound to Sn with a metal-carbon bond, n=1-3 and X is a ligand having a hydrolysable bond with Sn; and

inputting into the deposition chamber a second precursor vapor comprising a second organotin composition represented by the formula R′_mSnX′_4-mwherein R′ is an organic ligand with 1-31 carbon atoms bound to Sn with a metal-carbon bond and R′ is different from R, m=1-3, and X′ is a ligand having a hydrolysable bond with Sn,

wherein a substrate receives on a surface the non-volatile components of a composition formed from the reaction of the first precursor vapor and the second precursor vapor with a third precursor vapor comprising an oxygen-containing compound that also form a volatile component comprising a reaction product with X and X′ ligands.