	US 12,276,911 B2
	Positive resist composition and pattern forming process
Jun Hatakeyama, Joetsu (JP); Masahiro Fukushima, Joetsu (JP); and Naoki Ishibashi, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Feb. 3, 2022, as Appl. No. 17/591,912.
Claims priority of application No. 2021-023420 (JP), filed on Feb. 17, 2021.
Prior Publication US 2022/0269171 A1, Aug. 25, 2022
Int. Cl. G03F 7/039 (2006.01); C08F 212/14 (2006.01); C08F 220/18 (2006.01); C08F 220/22 (2006.01)

CPC G03F 7/039 (2013.01) [C08F 212/24 (2020.02); C08F 220/1806 (2020.02); C08F 220/1807 (2020.02); C08F 220/1808 (2020.02); C08F 220/22 (2013.01)]

12 Claims

1. A positive resist composition comprising: an acid generator, and a base polymer comprising a repeat unit (a) derived from a triple bond-containing maleimide compound and a repeat unit (b) adapted to increase its solubility in an alkaline developer under the action of acid.