CPC G03F 7/039 (2013.01) [C08F 212/24 (2020.02); C08F 220/1807 (2020.02); C08F 220/1809 (2020.02); C08F 220/283 (2020.02); G03F 7/0045 (2013.01); G03F 7/038 (2013.01)] | 18 Claims |
1. A photoresist composition comprising:
a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first repeating unit is present in the first polymer in an amount from 30 to 50 mol %, based on total repeating units in the first polymer;
a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-aryl group;
a photoacid generator; and
a solvent,
wherein the first polymer and the second polymer are different from each other,
wherein the first polymer and the second polymer are present in a weight ratio from 1:2 to 1:4, and
wherein the second repeating unit of the first polymer is derived from a monomer of formula (2a′), (2b′), (2c′), (2d′), or (2e′):
![]() wherein, in formulae (2a′), (2b′), (2c′), (2d′), or (2e′),
Rc, Rd, and Re are each independently hydrogen, fluorine, cyano, substituted or unsubstituted C1-10 alkyl, or substituted or unsubstituted C1-10 fluoroalkyl;
R1 to R6 are each independently hydrogen, substituted or unsubstituted C1-20 alkyl, substituted or unsubstituted C3-20 cycloalkyl, substituted or unsubstituted C3-20 heterocycloalkyl, substituted or unsubstituted C2-20 alkenyl, substituted or unsubstituted C3-20 cycloalkenyl, substituted or unsubstituted C3-20 heterocycloalkenyl, substituted or unsubstituted C6-20 aryl, or substituted or unsubstituted C4-20 heteroaryl;
provided that only one of R1 to R3 can be hydrogen and only one of R4 to R6 can be hydrogen;
any two of R1 to R3 together optionally form a ring, and each of R1 to R3 optionally may include as part of their structure one or more groups selected from —O—, —C(O)—, —N(R42)—, —S—, or —S(O)2—, wherein R42 is hydrogen, a straight chain or branched C1-20 alkyl, monocyclic or polycyclic C3-20 cycloalkyl, or monocyclic or polycyclic C3-20 heterocycloalkyl;
any two of R4 to R6 together optionally form a ring, and each of R4 to R6 optionally may include as part of their structure one or more groups selected from —O—, —C(O)—, —N(R43)—, —S—, or —S(O)2—, wherein R43 is hydrogen, a straight chain or branched C1-20 alkyl, monocyclic or polycyclic C3-20 cycloalkyl, or monocyclic or polycyclic C3-20 heterocycloalkyl;
L2 is a divalent linking;
R7 to R8 are each independently hydrogen, substituted or unsubstituted C1-20 alkyl, substituted or unsubstituted C3-20 cycloalkyl, substituted or unsubstituted C3-20 heterocycloalkyl, substituted or unsubstituted C6-20 aryl, or substituted or unsubstituted C4-20 heteroaryl,
R9 is substituted or unsubstituted C1-20 alkyl, substituted or unsubstituted C3-20 cycloalkyl, or substituted or unsubstituted C3-20 heterocycloalkyl, wherein one of R7 or R8 optionally forms a heterocyclic ring together with R9;
R10 to R12 are each independently substituted or unsubstituted C1-20 alkyl, substituted or unsubstituted C3-20 cycloalkyl, substituted or unsubstituted C3-20 heterocycloalkyl, substituted or unsubstituted C6-20 aryl, or substituted or unsubstituted C4-20 heteroaryl;
any two of R10 to R12 together optionally form a ring, and each of R10 to R12 optionally comprise as part of their structure one or more groups selected from —O—, —C(O)—, —N(R44)—, —S—, or —S(O)2—, wherein R44 is hydrogen, straight chain or branched C1-20 alkyl, monocyclic or polycyclic C3-20 cycloalkyl, or monocyclic or polycyclic C3-20 heterocycloalkyl;
Xa is a polymerizable group selected from norbornyl or vinyl;
n is 1; and
L3 is a single bond or a divalent linking group, provided that L3 is not a single bond when Xa is vinyl.
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