| CPC G03F 7/0002 (2013.01) | 5 Claims |
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1. An imprint method of performing an imprint process for a shot region of a substrate using a mold, wherein
the substrate includes a valid region where a chip is to be formed, and an invalid region outside the valid region where no chip is to be formed, and the invalid region is a region formed by etching an outer region outside the valid region, and
the method comprises
deciding, based on a height difference between the valid region and the invalid region, an imprint condition for a partial shot region defined by an outer edge of the valid region;
performing the imprint process for the partial shot region in accordance with the decided imprint condition;
acquiring information of a substrate end structure which is a structure of the invalid region of the substrate; and
predicting, based on a relationship between an imprint condition and a displacement of the mold in an imprint process, the relationship being obtained in advance, a displacement of the mold in an imprint process performed under a temporarily set imprint condition,
wherein in the deciding the imprint condition, the imprint condition is decided by modifying the temporarily set imprint condition based on the height difference obtained from the substrate end structure and the predicted displacement, and wherein
the imprint condition includes a plurality of imprint conditions,
the method further comprises deciding a priority of modification of each condition based on information of a sensitivity to a relative shot shape between the mold and the substrate and a sensitivity to deformation of the mold with respect to a change in each of the plurality of imprint conditions, and
in the deciding the imprint condition, the imprint condition is modified in an order of the priority.
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