US 12,276,815 B2
EUV collector mirror
Marcus Van De Kerkhof, Veldhoven (NL)
Assigned to CARL ZEISS SMT GMBH, Oberkochen (DE); and ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by CARL ZEISS SMT GMBH, Oberkochen (DE); and ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Apr. 15, 2022, as Appl. No. 17/722,028.
Application 17/722,028 is a continuation of application No. PCT/EP2020/075493, filed on Sep. 11, 2020.
Claims priority of application No. 10 2019 215 829.3 (DE), filed on Oct. 15, 2019.
Prior Publication US 2022/0236461 A1, Jul. 28, 2022
Int. Cl. H05G 2/00 (2006.01); G02B 5/08 (2006.01); G02B 5/09 (2006.01); G02B 19/00 (2006.01); G03F 7/00 (2006.01)
CPC G02B 5/0891 (2013.01) [G02B 5/09 (2013.01); G02B 19/0095 (2013.01); G03F 7/70316 (2013.01)] 12 Claims
OG exemplary drawing
 
1. Collector mirror configured for extreme ultraviolet (EUV) light, comprising:
a reflection surface to reflect usable EUV light which impinges on the reflection surface from a source region to a subsequent EUV optics,
wherein the reflection surface carries a pump light grating structure configured to retroreflect pump light which impinges upon the pump light grating structure from the source region back to the source region, the pump light having a wavelength (λPL) deviating from the wavelength of the usable EUV light, and
wherein a pitch of the pump light grating structure varies over the reflection surface of the EUV collector mirror.