US 12,276,684 B2
Method and apparatus for determining cable length for plasma processing equipment
Tae Hoon Jo, Seoul (KR); Hyo Seong Seong, Changwon-si (KR); Ji Hyun Kim, Ansan-si (KR); and Ja Myung Gu, Cheonan-si (KR)
Assigned to SEMES CO., LTD., Cheonan-si (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Nov. 23, 2022, as Appl. No. 17/992,972.
Claims priority of application No. 10-2021-0181569 (KR), filed on Dec. 17, 2021.
Prior Publication US 2023/0194585 A1, Jun. 22, 2023
Int. Cl. G01R 27/16 (2006.01)
CPC G01R 27/16 (2013.01) 10 Claims
OG exemplary drawing
 
1. A method of setting plasma processing equipment, the method comprising:
an impedance measuring step of measuring an impedance of a power supply cable to be applied;
an electrical length calculating step of calculating an electrical length of the power supply cable on the basis of the measured impedance;
a cable length determining step of determining a length of the power supply cable on the basis of the calculated electrical length; and
applying the power supply cable having the determined length to the plasma processing equipment,
wherein the electrical length calculating step is performed by calculating the electrical length through [Equation 1] below:

OG Complex Work Unit Math
and
wherein L is the electrical length, n is a wavelength period, λ is a wavelength, β is a wave number, Z is an open impedance, and e is a measurement error.