US 12,276,038 B2
Process method for controlling glossiness of electroplated nickel-layer
Weihua Shao, Chuzhou (CN); Jiangping Yang, Chuzhou (CN); and Dewei Jiang, Chuzhou (CN)
Assigned to Luxshare Precision Industry(Chuzhou), Ltd., Chuzhou (CN)
Filed by Luxshare Precision Industry(Chuzhou), Ltd., Chuzhou (CN)
Filed on May 25, 2023, as Appl. No. 18/202,157.
Claims priority of application No. 202310120401.X (CN), filed on Feb. 3, 2023.
Prior Publication US 2024/0263334 A1, Aug. 8, 2024
Int. Cl. C25D 3/12 (2006.01); C23C 28/02 (2006.01); C25D 3/38 (2006.01); C25D 5/00 (2006.01); C25D 5/14 (2006.01); C25D 5/34 (2006.01); C25D 5/50 (2006.01)
CPC C25D 5/627 (2020.08) [C25D 3/12 (2013.01); C25D 3/38 (2013.01); C25D 5/14 (2013.01); C25D 5/34 (2013.01); C25D 5/50 (2013.01)] 12 Claims
 
1. A process method for controlling a glossiness of an electroplated nickel-layer to 290-310 Gu, comprising:
subjecting a metal substrate to pre-treatment, copper plating process, satin-nickel plating process, semi-bright-nickel plating process, and post-treatment in turn;
wherein an obtained product sheet with the electroplated nickel-layer prepared by the process method has the glossiness of 290-310 Gu;
wherein a temperature of a copper plating electrolyte used in the copper plating process is 64-68° C., a plating layer in the copper plating process has a roughness Ra of 0.1-0.3, the plating layer in the copper plating process comprises copper;
wherein a first nickel-layer is obtained by the satin-nickel plating process; the satin-nickel plating process has a current density of 2-3 A/dm2; a satin-plating electrolyte used in the satin-nickel plating process has a pH of 3.8-4.2; the first nickel-layer is a satin-nickel layer; and
wherein a second nickel-layer is obtained by the semi-bright-nickel plating process; the semi-bright-nickel plating process has a current density of 2-3 A/dm2; a semi-bright-nickel electrolyte used in the semi-bright-nickel plating process has a pH of 4.2-4.6; the second nickel-layer is a semi-bright-nickel layer.