| CPC C23C 16/45565 (2013.01) [C23C 16/4557 (2013.01); C23C 16/45572 (2013.01)] | 21 Claims |

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1. A showerhead assembly for distributing a gas within a reaction chamber, the showerhead assembly comprising:
a chamber formed within the showerhead assembly; and
a gas distribution assembly adjacent to the chamber, wherein the gas distribution assembly comprises:
a first gas distribution plate comprising a first top surface and a first bottom surface, wherein the first gas distribution plate comprises a first metallic material;
a second gas distribution plate comprising a second top surface and a second bottom surface, the second gas distribution plate disposed over the first top surface, wherein the second distribution plate comprises a second metallic material;
a plurality of apertures extending from the first bottom surface to the second top surface; and
one or more heating structures disposed between the first gas distribution plate and the second gas distribution plate, wherein each heating structure comprises:
a first dielectric layer in direct contact with, and disposed over, the first top surface;
a second dielectric layer in direct contact with the second bottom surface; and
a resistive material disposed over the first dielectric layer, wherein the second dielectric layer is disposed over the resistive material, wherein the resistive material is in direct contact with and fully surrounded by, and encapsulated between, the first dielectric layer and the second dielectric layer,
wherein the first metallic material is one or more materials selected from a group consisting of aluminum, titanium, nickel, a nickel alloy, stainless steel and Hastelloy, and wherein the second metallic material is one or more materials selected from a group consisting of aluminum, titanium, nickel, a nickel alloy, stainless steel and Hastelloy.
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