US 12,275,921 B2
Treatment liquid and substrate treatment method
Tomonori Takahashi, Shizuoka (JP); Yasuo Sugishima, Shizuoka (JP); and Atsushi Mizutani, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Feb. 16, 2023, as Appl. No. 18/170,195.
Application 18/170,195 is a continuation of application No. PCT/JP2021/030094, filed on Aug. 18, 2021.
Claims priority of application No. 2020-140565 (JP), filed on Aug. 24, 2020; application No. 2021-007860 (JP), filed on Jan. 21, 2021; and application No. 2021-131974 (JP), filed on Aug. 13, 2021.
Prior Publication US 2023/0287304 A1, Sep. 14, 2023
Int. Cl. C11D 3/34 (2006.01); C11D 1/04 (2006.01); C11D 1/14 (2006.01); C11D 1/34 (2006.01); C11D 3/00 (2006.01); C11D 3/30 (2006.01); H01L 21/02 (2006.01); H01L 21/3213 (2006.01)
CPC C11D 3/3454 (2013.01) [C11D 1/04 (2013.01); C11D 1/143 (2013.01); C11D 1/34 (2013.01); C11D 3/0026 (2013.01); C11D 3/0073 (2013.01); C11D 3/30 (2013.01); H01L 21/02065 (2013.01); H01L 21/02074 (2013.01); H01L 21/02178 (2013.01); H01L 21/02186 (2013.01); H01L 21/02244 (2013.01); C11D 2111/22 (2024.01); H01L 21/32138 (2013.01)] 28 Claims
 
1. A treatment liquid for a semiconductor device, comprising:
water;
a removing agent; and
a resin,
wherein the resin has a first repeating unit having at least one selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit, and
the second repeating unit comprises a sulfonyl group, or a repeating unit represented by Formula (2a),

OG Complex Work Unit Chemistry
in Formula (2a), A21, A22, and A23 each independently represent a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, or -L2-X21,
where X21 represents a hydrophilic group selected from the group consisting of a carboxy group, an alkoxy group, a polyoxyalkylene group, an amide group, a carbamoyl group, a nitrile group, a sulfonamide group, and a sulfamoyl group,
L2 represents a divalent linking group, and
in a case where two or more X21's or two or more L2's are present, the two or more X21's or two or more L2's may be the same or different from each other.