US 11,955,546 B2
Semiconductor device and method for controlling same
Takeshi Suwa, Kawasaki Kanagawa (JP); Tomoko Matsudai, Shibuya Tokyo (JP); and Yoko Iwakaji, Meguro Tokyo (JP)
Assigned to Kabushiki Kaisha Toshiba, Tokyo (JP); and Toshiba Electronic Devices and Storage Corporation, Tokyo (JP)
Filed by KABUSHIKI KAISHA TOSHIBA, Tokyo (JP); and TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION, Tokyo (JP)
Filed on Sep. 8, 2020, as Appl. No. 17/014,794.
Claims priority of application No. 2020-047541 (JP), filed on Mar. 18, 2020.
Prior Publication US 2021/0296495 A1, Sep. 23, 2021
Int. Cl. H01L 29/78 (2006.01); H01L 29/423 (2006.01); H01L 29/739 (2006.01); H03K 17/16 (2006.01)
CPC H01L 29/7831 (2013.01) [H01L 29/4236 (2013.01); H01L 29/42376 (2013.01); H01L 29/7397 (2013.01); H01L 29/7813 (2013.01); H03K 17/168 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A semiconductor device, comprising:
a semiconductor part;
a first electrode provided at a backside of the semiconductor part;
a second electrode provided at a front side of the semiconductor part;
a first control electrode provided between the semiconductor part and the second electrode, the first control electrode being provided inside the semiconductor part and electrically insulated from the semiconductor part by a first insulating portion, the first control electrode being electrically insulated from the second electrode by a first inter-layer insulating film;
a second control electrode provided between the semiconductor part and the second electrode, the second control electrode being provided inside the semiconductor part, the first and second control electrodes being arranged in a first direction along a front surface of the semiconductor part, the second control electrode being electrically insulated from the semiconductor part by a second insulating portion and electrically insulated from the second electrode by a second inter-layer insulating film, the second control electrode being electrically isolated from the first control electrode;
a plurality of third control electrodes provided respectively between the first control electrode and the first electrode and between the second control electrode and the first electrode, the third control electrodes being provided inside the semiconductor part, the third control electrodes each being electrically insulated from the semiconductor part by a third insulating portion, the third control electrodes being electrically insulated respectively from the first and second control electrodes by a fourth insulating portion;
a first interconnect electrically connected to the first control electrode;
a second interconnect electrically connected to the second control electrode; and
a third interconnect connected to the plurality of third control electrodes,
the semiconductor part including a first layer of a first conductivity type, a second layer of a second conductivity type, a third layer of the first conductivity type, and a fourth layer of the second conductivity type,
the first layer extending between the first electrode and the second electrode, the third control electrodes being provided inside the first layer,
the second layer being provided between the first layer and the second electrode, the second layer facing the first control electrode via the first insulating portion and facing the second control electrode via the second insulating portion,
the third layer being selectively provided between the second layer and the second electrode, the third layer contacting the first insulating portion and being electrically connected to the second electrode,
the fourth layer being provided between the first layer and the first electrode and electrically connected to the first electrode, and
the third control electrodes each having a thickness in a second direction from the first electrode toward the second electrode, the thickness of the third control electrodes being less than a thickness in the second direction of the fourth insulating portion.