US 11,955,343 B2
Two-stage bake photoresist with releasable quencher
Robert L. Bristol, Portland, OR (US); Marie Krysak, Portland, OR (US); James M. Blackwell, Portland, OR (US); Florian Gstrein, Portland, OR (US); and Kent N. Frasure, Forest Grove, OR (US)
Assigned to Intel Corporation, Santa Clara, CA (US)
Filed by Intel Corporation, Santa Clara, CA (US)
Filed on Mar. 22, 2022, as Appl. No. 17/701,367.
Application 17/701,367 is a division of application No. 16/075,555, granted, now 11,315,798, previously published as PCT/US2016/026599, filed on Apr. 8, 2016.
Prior Publication US 2022/0216065 A1, Jul. 7, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/768 (2006.01)
CPC H01L 21/31144 (2013.01) [G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/203 (2013.01); G03F 7/38 (2013.01); H01L 21/0273 (2013.01); H01L 21/0337 (2013.01); H01L 21/76801 (2013.01); H01L 21/76808 (2013.01); H01L 21/76816 (2013.01)] 9 Claims
 
1. A method of forming a photolyzable composition, the method comprising:
providing an acid-deprotectable photoresist material having substantial transparency at a wavelength, wherein the acid-deprotectable photoresist material is an acid-deprotectable material selected from the group consisting of a molecular glass, a carbosilane and a metal oxide;
providing a photo-acid-generating (PAG) component having substantial transparency at the wavelength;
providing a base-generating component having substantial absorptivity at the wavelength, wherein the base-generating component comprises N,N-dicyclohexyl-2-nitrophenylcarbamate; and
combining the acid-deprotectable photoresist material, the PAG component, and the base-generating component.