US 11,955,314 B2
Plasma processing apparatus
Chishio Koshimizu, Miyagi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed on Jan. 8, 2020, as Appl. No. 16/737,335.
Claims priority of application No. 2019-001914 (JP), filed on Jan. 9, 2019; and application No. 2019-215425 (JP), filed on Nov. 28, 2019.
Prior Publication US 2020/0219701 A1, Jul. 9, 2020
Int. Cl. H01L 21/00 (2006.01); H01G 5/013 (2006.01); H01J 37/32 (2006.01)
CPC H01J 37/32082 (2013.01) [H01G 5/0132 (2013.01); H01J 37/32568 (2013.01); H01J 37/32715 (2013.01); H01J 2237/2007 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus for plasma processing comprising:
a chamber;
a substrate support, having a lower electrode and an electrostatic chuck, configured to support a substrate on the electrostatic chuck in the chamber;
a radio frequency power supply configured to supply a radio frequency power to generate plasma in the chamber;
a bias power supply configured to supply a bias power;
a first electrical path that electrically connects the bias power supply with the lower electrode;
a second electrical path that is different from the first electrical path and the lower electrode and configured to supply the bias power from the lower electrode or the first electrical path to an edge ring disposed to surround an edge of the substrate; and
an impedance adjuster configured to provide a variable impedance to the second electrical path,
wherein the second electrical path includes a plurality of conductive lines each connected to the impedance adjuster, each of the conductive lines of the second electrical path extending from the impedance adjuster in a direction away from a central axis of the lower electrode, and the conductive lines of the second electrical path are configured to supply the bias power to the edge ring at multiple locations having the same distance from the central axis, the multiple locations being arranged at equal intervals in the circumferential direction with respect to the central axis.