US 11,953,838 B2
Lithography support cleaning with cleaning substrate having controlled geometry and composition
Keane Michael Levy, Wilton, CT (US); and Akshay Dipakkumar Harlalka, Norwalk, CT (US)
Assigned to ASML Holding N.V., Veldhoven (NL)
Appl. No. 17/291,322
Filed by ASML Holding N.V., Veldhoven (NL)
PCT Filed Oct. 31, 2019, PCT No. PCT/EP2019/079934
§ 371(c)(1), (2) Date May 5, 2021,
PCT Pub. No. WO2020/094517, PCT Pub. Date May 14, 2020.
Claims priority of provisional application 62/912,971, filed on Oct. 9, 2019.
Claims priority of provisional application 62/757,837, filed on Nov. 9, 2018.
Prior Publication US 2022/0026819 A1, Jan. 27, 2022
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70925 (2013.01) 29 Claims
OG exemplary drawing
 
1. An apparatus comprising:
a clamping structure comprising a working surface, wherein the working surface comprises a plurality of burls; and
a cleaning substrate configured to remove a contaminant from the working surface, the cleaning substrate comprising:
a base having a lateral surface; and
a coating on only a part of the lateral surface,
wherein the coating forms a single raised surface for removing the contaminant and a remaining part of the lateral surface is uncoated, and
wherein the remaining part of the lateral surface is located in an inner portion of a confrontation area with the working surface.