	US 11,953,833 B2
	Compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and transistor production method
Yusuke Kawakami, Yokohama (JP); Kazuo Yamaguchi, Yokohama (JP); and Michiko Itou, Yokohama (JP)
Assigned to NIKON CORPORATION, Tokyo (JP)
Filed by NIKON CORPORATION, Tokyo (JP); and KANAGAWA UNIVERSITY, Yokohama (JP)
Filed on Apr. 8, 2020, as Appl. No. 16/843,232.
Application 16/843,232 is a continuation of application No. PCT/JP2018/037023, filed on Oct. 3, 2018.
Claims priority of application No. 2017-197501 (JP), filed on Oct. 11, 2017; and application No. 2018-045274 (JP), filed on Mar. 13, 2018.
Prior Publication US 2020/0233304 A1, Jul. 23, 2020
Int. Cl. G03F 7/075 (2006.01); C07F 7/18 (2006.01); C23C 18/20 (2006.01); C23C 18/44 (2006.01); H10K 10/46 (2023.01); H10K 71/00 (2023.01); G03F 7/20 (2006.01); H10K 10/84 (2023.01)

CPC G03F 7/0755 (2013.01) [C07F 7/1804 (2013.01); C23C 18/204 (2013.01); C23C 18/44 (2013.01); H10K 10/466 (2023.02); H10K 71/621 (2023.02); G03F 7/20 (2013.01); H10K 10/481 (2023.02); H10K 10/84 (2023.02)]

14 Claims

1. A compound represented by Formula (1)

[in the formula, X represents a halogen atom or an alkoxy group, R¹represents any one group selected from an alkyl group having 1 to 5 carbon atoms, a group represented by Formula (R2-1), and a group represented by Formula (R2-2), R²represents a group represented by Formula (R2-1) or (R2-2), n0 represents an integer of 0 or greater, n1 represents an integer of 0 to 5, and n2 represents a natural number of 1 to 5]

[in the formulae, R²¹and R²²each independently represents an alkyl group having 1 to 5 carbon atoms, n represents a natural number, and the wavy line represents a bonding site].