CPC G03F 7/0233 (2013.01) [G03F 7/40 (2013.01); H01L 23/5329 (2013.01); H10K 59/122 (2023.02); H10K 59/124 (2023.02)] | 15 Claims |
1. A photosensitive resin composition comprising:
a polyimide precursor (a), the polyimide precursor (a) having a residue derived from a diamine having an ionization potential of less than 7.1 eV;
a phenol compound (b) having an electron withdrawing group; and
a photosensitive compound (c).
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