US 11,953,829 B2
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
Kazunari Yagi, Haibara-gun (JP); Takashi Kawashima, Haibara-gun (JP); Tomotaka Tsuchimura, Haibara-gun (JP); Hajime Furutani, Haibara-gun (JP); and Michihiro Shirakawa, Haibara-gun (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Feb. 21, 2020, as Appl. No. 16/797,035.
Application 16/797,035 is a continuation of application No. PCT/JP2018/032598, filed on Sep. 3, 2018.
Claims priority of application No. 2017-180108 (JP), filed on Sep. 20, 2017; and application No. 2018-003463 (JP), filed on Jan. 12, 2018.
Prior Publication US 2020/0192220 A1, Jun. 18, 2020
Int. Cl. G03F 7/004 (2006.01); C08F 212/14 (2006.01); C08F 220/28 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01)
CPC G03F 7/0045 (2013.01) [C08F 212/24 (2020.02); C08F 220/282 (2020.02); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01)] 13 Claims
 
1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
a resin having a repeating unit having a group in which a phenolic hydroxyl group is protected with an acid-leaving group and a repeating unit having a lactone structure;
a first photoacid generator that generates an acid having a pKa of −2.00 to 2.00, in which in a case where the acid thus generated is a carboxylic acid, a pKa of the carboxylic acid is −2.00 or more and less than 1.00;
a second photoacid generator that generates a carboxylic acid having a pKa of 1.00 or more,
wherein the second photoacid generator is a photoacid generator that generates benzenecarboxylic acid having a substituent which is a fluorine atom or a group including a fluorine atom, and
the first photoacid generator is formed of an anion and a cation, and the anion has a cyclic acetal structure.