US 11,952,659 B2
Methods for coating a substrate with magnesium fluoride via atomic layer deposition
Ming-Huang Huang, Ithaca, NY (US); Hoon Kim, Horseheads, NY (US); and Jue Wang, Pittsford, NY (US)
Assigned to Corning Incorporated, Corning, NY (US)
Filed by CORNING INCORPORATED, Corning, NY (US)
Filed on Jul. 28, 2020, as Appl. No. 16/940,836.
Claims priority of provisional application 62/880,250, filed on Jul. 30, 2019.
Prior Publication US 2021/0032744 A1, Feb. 4, 2021
Int. Cl. G02B 1/115 (2015.01); C23C 16/30 (2006.01); C23C 16/455 (2006.01); H01L 21/67 (2006.01); G01N 21/95 (2006.01)
CPC C23C 16/30 (2013.01) [C23C 16/45553 (2013.01); G02B 1/115 (2013.01); H01L 21/67288 (2013.01); G01N 21/9501 (2013.01)] 19 Claims
OG exemplary drawing
 
1. An atomic layer deposition method for coating an optical lens with a magnesium fluoride layer, the method comprising:
(i) exposing an optical lens to a precursor gas comprising magnesium, thereby forming a magnesium-containing precursor layer over a surface of the lens;
(ii) exposing the magnesium-containing precursor layer to a first oxygen-containing gas, thereby forming a magnesium oxide layer;
(iii) exposing the magnesium oxide layer to a source gas comprising fluorine, thereby forming an intermediate layer comprising magnesium and fluoride; and
(iv) exposing the intermediate layer to a second oxygen-containing gas, thereby forming a magnesium fluoride layer.