CPC C23C 14/042 (2013.01) [C23C 14/34 (2013.01); C23C 14/50 (2013.01); C23C 14/541 (2013.01)] | 9 Claims |
1. A process assembly of a sputtering reaction chamber comprising:
a liner including:
a body member being in a ring shape; and
a cover member integrally formed with the body member, extending from a bottom of the body member along a radial direction of the body member, and configured to fix a to-be-processed workpiece placed over a base when a process is performed, wherein:
a cooling channel is arranged in the cover member and the body member and includes a first cooling channel in the body member and a second cooling channel in the cover member, the first cooling channel communicating with the second cooling channel;
a deposition ring, wherein the cover member and the deposition ring cooperate with each other to form a labyrinth channel,
the deposition ring including:
a deposition member arranged radially with a bottom surface on top of the base and configured to contact with and support an outer edge of the to-be-processed workpiece,
a deposition-ring convex member arranged axially, and
a deposition-ring concave groove between the deposition-ring convex member and the deposition member;
wherein
the cover member includes a cover-member concave member in a ring shape corresponding to, and cooperating with, the deposition-ring convex member, and
the cover member further includes a cover-member convex member with an inner ring sidewall inserted into the deposition-ring concave groove to form the labyrinth channel.
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