US 11,951,583 B2
Electrostatic chuck with high insulation performance and electrostatic attraction force
Hiroshi Takebayashi, Handa (JP); Kenichiro Aikawa, Handa (JP); and Tatsuya Kuno, Nagoya (JP)
Assigned to NGK INSULATORS, LTD., Nagoya (JP)
Filed by NGK INSULATORS, LTD., Nagoya (JP)
Filed on Aug. 31, 2021, as Appl. No. 17/462,048.
Application 17/462,048 is a continuation of application No. PCT/JP2020/022831, filed on Jun. 10, 2020.
Claims priority of application No. 2019-121488 (JP), filed on Jun. 28, 2019.
Prior Publication US 2021/0394320 A1, Dec. 23, 2021
Int. Cl. B23Q 3/15 (2006.01); B23K 1/00 (2006.01); B23K 1/19 (2006.01); B23K 103/00 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01)
CPC B23Q 3/15 (2013.01) [B23K 1/0016 (2013.01); B23K 1/19 (2013.01); H01L 21/6833 (2013.01); H01L 21/68757 (2013.01); B23K 2103/52 (2018.08)] 4 Claims
OG exemplary drawing
 
1. An electrostatic chuck comprising:
a ceramic base;
a ceramic dielectric layer positioned on the ceramic base and being thinner than the ceramic base;
an electrostatic electrode embedded between the ceramic dielectric layer and the ceramic base; and
a ceramic insulating layer positioned on the ceramic dielectric layer and being thinner than the ceramic dielectric layer,
wherein the ceramic insulating layer has a higher volume resistivity and withstand voltage than the ceramic dielectric layer and is an aerosol deposition film, and
the ceramic dielectric layer has a higher dielectric constant than the ceramic insulating layer; and
wherein the aerosol deposition film is void of a glass base with low insulation at grain boundaries between raw material grains.