US 11,950,553 B2
Complex traits using tissue technology
Jeroen Stuurman, Wageningen (NL)
Assigned to Keygene N.V., Wageningen (NL)
Filed by Keygene N.V., Wageningen (NL)
Filed on Jun. 21, 2019, as Appl. No. 16/449,329.
Application 16/449,329 is a continuation of application No. PCT/EP2017/084300, filed on Dec. 22, 2017.
Claims priority of application No. 2018058 (NL), filed on Dec. 23, 2016.
Prior Publication US 2020/0045916 A1, Feb. 13, 2020
Int. Cl. A01H 1/02 (2006.01); A01H 3/00 (2006.01); A01H 6/82 (2018.01); A01H 1/04 (2006.01); A01H 5/10 (2018.01)
CPC A01H 1/021 (2021.01) [A01H 3/00 (2013.01); A01H 6/82 (2018.05); A01H 1/04 (2013.01); A01H 5/10 (2013.01)] 12 Claims
 
1. A method for producing a periclinal chimera plant comprising a first L1-localized trait of interest and a second L1-localized trait of interest, the method comprising:
(a) crossing a wild species comprising the first L1-localized trait of interest and a cultivar comprising the second L1-localized trait of interest, wherein the wild species does not comprise the second L1-localized trait of interest and the cultivar does not comprise the first L1-localized trait of interest, wherein the first L1-localized trait and the second L1-localized trait is passed to an offspring plant after crossing;
(b) selecting a first plant comprising the first L1-localized trait of interest and the second L1-localized trait of interest from the offspring plants produced by the crossing in step (a);
(c) providing a second plant not comprising both the first L1-localized trait of interest and the second L1-localized trait of interest; and
(d) making a periclinal chimera plant comprising an L1-shoot meristem layer of the first plant and the L2 and L3-shoot meristem layer of the second plant, and wherein the first and second L1-localized trait of interest is selected from the group consisting of biotic stress resistance, abiotic stress resistance, improved seed germination, fruit color and the ability to accept pollen produced by the second plant or by the plant itself.