| CPC H01L 27/14649 (2013.01) [H01L 31/03046 (2013.01); H01L 31/035236 (2013.01)] | 16 Claims |

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1. A device (D1) for detecting infrared radiation, comprising at least one pixel (Pxl) having an axis (Δ) in a direction Z, said pixel comprising a first absorbent planar structure (SPA) comprising at least one semiconductor layer (Cmm, C1, C2);
each layer (Cmm, C1, C2) of the first absorbent planar structure (SPA) being arranged in a crystal lattice structure;
the first absorbent planar structure (SPA) being N-doped and being produced epitaxially on a substrate (Sub), and the composition of the materials used to produce the at least one layer (Cmm, C1, C2) of the first absorbent planar structure (SPA) being chosen such that:
the first absorbent planar structure (SPA) has an effective valence band (BVeff) formed by a plurality of energy levels (Evhh, Evlh); each energy level (Evhh, Evlh) being occupied by one of:
a first type of positive charge carrier, called heavy holes (hh), having a first effective mass (mhh);
or a second type of positive charge carrier, called light holes (lh), having a second effective mass (mlh) strictly less than the first effective mass (mhh);
the maximum energy level of the effective valence band (BVeff) being occupied by light holes (lh) along the axis (Δ) of the pixel;
the crystal lattice structure of said layer does not exhibit any dislocations resulting from mechanical relaxation of said lattices;
the effective mass of the positive charge carriers along the axis of the pixel (Δ) being less than half the effective mass of the positive charge carriers in directions defining a plane orthogonal to the axis of the pixel (Δ).
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