US 12,272,607 B2
Method of enhancing contrast while imaging high aspect ratio structures in electron microscopy
Geetika Bajaj, Mumbai (IN); Prerna Sonthalia Goradia, Mumbai (IN); and Robert J. Visser, Menlo Park, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Appl. No. 17/770,434
Filed by Applied Materials, Inc., Santa Clara, CA (US)
PCT Filed Dec. 8, 2020, PCT No. PCT/US2020/063815
§ 371(c)(1), (2) Date Apr. 20, 2022,
PCT Pub. No. WO2021/141709, PCT Pub. Date Jul. 15, 2021.
Claims priority of application No. 202041000949 (IN), filed on Jan. 9, 2020.
Prior Publication US 2022/0392810 A1, Dec. 8, 2022
Int. Cl. H01L 21/66 (2006.01); B05D 1/00 (2006.01); B82Y 40/00 (2011.01); G01B 15/04 (2006.01)
CPC H01L 22/12 (2013.01) [B05D 1/60 (2013.01); B82Y 40/00 (2013.01); G01B 15/04 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for depositing a layer of nanoparticles or a nano-layer to a semiconductor device, comprising:
modifying synthesized nanoparticles with an organic molecule, the organic molecule comprising:
a head group that binds to a surface of the synthesized nanoparticle; and
a tail group; and
depositing the synthesized nanoparticles onto at least part of a semiconductor structure, wherein the tail group binds the synthesized nanoparticles to at least part of the semiconductor structure and forms a nano-layer.