| CPC H01J 37/32917 (2013.01) [G01R 27/2605 (2013.01); H01J 37/32183 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/332 (2013.01)] | 18 Claims |

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1. A broad-band sensor for a radio frequency plasma processing system comprising:
a capacitive pickup for electrical potentials disposed on an electrically conducting component of a reaction chamber;
a lead that comprises a circuit, the lead connecting the pickup to a connector mounted into an electrically grounded plate proximate the pickup with an electrical resistance of the circuit and a capacitance to an electrical ground of the connector being such that the pickup voltage differs by less than 5% from a surface voltage of the electrically conducting component; and
an attenuator circuit connected to the connector, comprising at least one current limiting resistor in series from an attenuator input to an attenuator output; and
wherein the broad-band sensor has detection within a radio frequency range from about 10 KHz to at least about 1 GHz for radio frequency electrical potential measurements in the radio frequency plasma processing system.
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