US 12,272,527 B2
Apparatus for use with hydrogen radicals and method of using same
Xing Lin, Chandler, AZ (US); Chuang Wei, Chandler, AZ (US); Wentao Wang, Phoenix, AZ (US); Peipei Gao, Tempe, AZ (US); Fei Wang, Tempe, AZ (US); and Bubesh Babu Jotheeswaran, Gilbert, AZ (US)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on May 9, 2018, as Appl. No. 15/974,948.
Prior Publication US 2019/0348261 A1, Nov. 14, 2019
Int. Cl. H01L 21/67 (2006.01); B08B 5/00 (2006.01); B08B 17/06 (2006.01); H01J 37/32 (2006.01); C23C 16/40 (2006.01); H01L 21/02 (2006.01); H01L 21/30 (2006.01)
CPC H01J 37/32495 (2013.01) [B08B 5/00 (2013.01); B08B 17/06 (2013.01); H01J 37/3244 (2013.01); H01L 21/67017 (2013.01); C23C 16/403 (2013.01); H01J 2237/335 (2013.01); H01L 21/02057 (2013.01); H01L 21/3003 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A reactor system comprising:
a reaction chamber comprising a reaction chamber space and an interior surface;
a remote plasma source coupled to the reaction chamber;
a gas distribution apparatus having a top section and a bottom section defining a chamber therebetween, wherein the bottom section comprises a plurality of holes formed therethrough fluidly connected between the chamber and the reaction chamber space, wherein the top section comprises an inlet configured to receive all gas entering the gas distribution apparatus, wherein the bottom section comprises a center region and an outer region, wherein the center region has holes of the plurality of holes with a first diameter and the outer region has holes of the plurality of holes with a second diameter, wherein the center region is 75 percent to 99 percent of the bottom section;
a manifold plate disposed in its entirety in the chamber between the top section and the bottom section of the gas distribution apparatus, wherein the manifold plate comprises:
a plurality of gas channels defined within the manifold plate and fluidly connected between the inlet in the top section and the chamber, such that all of the gas travels from the inlet, through the plurality of gas channels in the manifold plate, and into the chamber, wherein each of the plurality of gas channels extends radially within the chamber between 20 percent and 80 percent of the distance from the center region of the chamber to an edge of the chamber, wherein a diameter of each of the gas channels ranges from about 5 mm to about 15 mm, and wherein the plurality of gas channels is configured to distribute all of the gas radially within the manifold plate away from the center region of the bottom section along each length of each of the plurality of gas channels; and
a hydrogen source coupled to the remote plasma source, wherein the remote plasma source is configured to produce a hydrogen radical,
wherein at least a portion of the gas distribution apparatus and at least a portion of the interior surface comprise a metal oxide coating configured to mitigate hydrogen radical surface recombination and promote hydrogen radical lifetime, wherein the metal oxide coating comprises at least one of a non-porous ALD aluminum oxide coating and a non-porous anodized aluminum oxide coating.