US 12,270,820 B2
Ejection subassembly pitches to match nanowell spacing
Jeffrey A. Nielsen, Corvallis, OR (US); Christie Dudenhoefer, Corvallis, OR (US); Debora J. Thomas, Corvallis, OR (US); Roberto A Pugliese, Corvallis, OR (US); and Diane R. Hammerstad, Corvallis, OR (US)
Assigned to Hewlett-Packard Development Company, L.P., Spring, TX (US)
Appl. No. 17/044,996
Filed by HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P., Spring, TX (US)
PCT Filed Jun. 4, 2018, PCT No. PCT/US2018/035887
§ 371(c)(1), (2) Date Oct. 2, 2020,
PCT Pub. No. WO2019/236053, PCT Pub. Date Dec. 12, 2019.
Prior Publication US 2021/0165007 A1, Jun. 3, 2021
Int. Cl. G01N 35/10 (2006.01); B01L 3/00 (2006.01); B01L 3/02 (2006.01)
CPC G01N 35/10 (2013.01) [B01L 3/0268 (2013.01); B01L 3/5085 (2013.01); B01L 2300/0809 (2013.01); B01L 2300/0893 (2013.01); B01L 2300/0896 (2013.01); B01L 2400/0439 (2013.01); B01L 2400/0442 (2013.01); G01N 2035/1034 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A fluidic ejection system comprising:
a fluidic die comprising:
a plurality of ejection subassemblies, wherein each ejection subassembly comprises:
a fluid actuator;
an ejection chamber to hold a volume of fluid; and
an opening through which the volume of fluid is ejected via the fluid actuator;
a substrate comprising an array of nanowells, wherein a pitch of the plurality of ejection subassemblies matches a spatial arrangement of nanowells of the array of nanowells on the substrate, and
wherein the plurality of ejection subassemblies are fixed in a first position and configured to address a first group of nanowells comprising a first portion of the array of nanowells on the substrate corresponding to the fixed position of the plurality of ejection subassemblies, and
a processing device, wherein the plurality of ejection subassemblies are configured to address a second group of nanowells comprising a second portion of the array of nanowells on the substrate when the substrate is instructed, by the processing device, to move relative to the fixed position of the plurality of ejection subassemblies such that the second group of nanowells comprising the second portion of the array of nanowells on the substrate corresponds to the fixed position of the plurality of ejection subassemblies.