US 12,270,100 B2
Transfer apparatus and film deposition apparatus using transfer apparatus
Yoshinori Ogo, Yokohama (JP); and Takaaki Aoyama, Yokohama (JP)
Assigned to SHINCRON CO., LTD., Yokohama (JP)
Appl. No. 17/788,192
Filed by Shincron Co., Ltd., Yokohama (JP)
PCT Filed Jul. 30, 2020, PCT No. PCT/JP2020/029241
§ 371(c)(1), (2) Date Jun. 22, 2022,
PCT Pub. No. WO2022/024295, PCT Pub. Date Feb. 3, 2022.
Prior Publication US 2023/0123586 A1, Apr. 20, 2023
Int. Cl. C23C 16/50 (2006.01); C23C 14/50 (2006.01); C23C 14/56 (2006.01)
CPC C23C 14/505 (2013.01) [C23C 14/568 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A transfer apparatus for a film deposition apparatus comprising a film deposition chamber that applies a predetermined surface treatment to an object and an auxiliary chamber that is spatially isolated from the film deposition chamber, the transfer apparatus comprising:
a rotating body configured to be rotatable and provided with a holding unit that is provided in the auxiliary chamber which is provided with an evacuation device for adjusting an inside thereof to a predetermined degree of vacuum, and holds the object to be transferred in an attachable and detachable manner, the holding unit being provided along an outer peripheral portion of the rotating body; and
a transfer mechanism having a gripping mechanism capable of gripping and releasing the object, the transfer mechanism transferring the object held in the film deposition chamber which is provided with an evacuation device for adjusting an inside thereof to a predetermined degree of vacuum to the holding unit of the rotating body and transferring another object held by the rotating body to the film deposition chamber.