US 12,269,752 B2
Halide production method
Takashi Kubo, Hyogo (JP); Yusuke Nishio, Osaka (JP); Akihiro Sakai, Nara (JP); and Akinobu Miyazaki, Osaka (JP)
Assigned to PANASONIC INTELLECTUAL PROPERTY MANAGEMNT CO., LTD., Osaka (JP)
Filed by Panasonic Intellectual Property Management Co., Ltd., Osaka (JP)
Filed on May 18, 2021, as Appl. No. 17/323,920.
Application 17/323,920 is a continuation of application No. PCT/JP2019/025437, filed on Jun. 26, 2019.
Claims priority of application No. 2018-247311 (JP), filed on Dec. 28, 2018.
Prior Publication US 2021/0269323 A1, Sep. 2, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. C01F 17/271 (2020.01); C01F 17/36 (2020.01); H01M 10/0525 (2010.01); H01M 10/0562 (2010.01)
CPC C01F 17/271 (2020.01) [C01F 17/36 (2020.01); H01M 10/0525 (2013.01); H01M 10/0562 (2013.01); C01P 2006/40 (2013.01); H01M 2300/008 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for producing a halide, the method comprising:
heat-treating a mixed material in an inert gas atmosphere, the mixed material being a mixture of (NH4)aMX3+a and LiZ,
wherein the M includes at least one element selected from the group consisting of Y, a lanthanoid, and Sc,
wherein the X is at least one element selected from the group consisting of Cl, Br, I, and F,
wherein the Z is at least one element selected from the group consisting of Cl, Br, I, and F,
wherein 0<a≤3 is satisfied, and
wherein, in the heat-treating, the mixed material is heat-treated at a temperature of greater than or equal to 500° C. and less than or equal to 650° C.