US 12,269,241 B2
Gas barrier film
Miki Fukugami, Tokyo (JP); and Kaoru Furuta, Tokyo (JP)
Assigned to TOPPAN INC., Tokyo (JP)
Filed by TOPPAN INC., Tokyo (JP)
Filed on Oct. 26, 2022, as Appl. No. 17/973,694.
Application 17/973,694 is a continuation of application No. PCT/JP2021/016307, filed on Apr. 22, 2021.
Claims priority of application No. 2020-079516 (JP), filed on Apr. 28, 2020.
Prior Publication US 2023/0053232 A1, Feb. 16, 2023
Int. Cl. B32B 27/08 (2006.01); B32B 1/08 (2006.01); B32B 27/32 (2006.01); B65D 65/40 (2006.01)
CPC B32B 27/08 (2013.01) [B32B 1/08 (2013.01); B32B 27/32 (2013.01); B65D 65/40 (2013.01); B32B 2250/02 (2013.01); B32B 2250/246 (2013.01); B32B 2255/10 (2013.01); B32B 2255/20 (2013.01); B32B 2255/26 (2013.01); B32B 2255/28 (2013.01); B32B 2307/7242 (2013.01); B32B 2307/7244 (2013.01); B32B 2311/24 (2013.01); B32B 2323/10 (2013.01); B32B 2383/00 (2013.01); B32B 2439/46 (2013.01); B32B 2439/70 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A gas barrier film, comprising:
a substrate layer containing polypropylene;
a resin layer containing a copolymer of propylene and another monomer;
a vapor deposition layer of an inorganic oxide; and
a gas barrier layer, laminated in this order, wherein
the vapor deposition layer has a thickness of 5 nm to 300 nm,
the resin layer has a thickness of 0.3 μm or more, and
a surface of the resin layer facing the vapor deposition layer has at least one softening temperature in a range of 100° C. to 170° C. when measured by local thermal analysis (LTA).