US 11,948,781 B2
Apparatus and system including high angle extraction optics
Christopher Campbell, Newburyport, MA (US); Costel Biloiu, Rockport, MA (US); Peter F. Kurunczi, Cambridge, MA (US); Jay R. Wallace, Danvers, MA (US); Kevin M. Daniels, Lynnfield, MA (US); Kevin T. Ryan, Wilmington, MA (US); Minab B. Teferi, Gloucester, MA (US); Frank Sinclair, Boston, MA (US); and Joseph C. Olson, Beverly, MA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jan. 27, 2021, as Appl. No. 17/160,042.
Claims priority of provisional application 63/039,760, filed on Jun. 16, 2020.
Prior Publication US 2021/0391155 A1, Dec. 16, 2021
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32788 (2013.01) [H01J 37/32568 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A processing system, comprising:
a plasma chamber operable to generate a plasma; and
an extraction assembly, arranged along a side of the plasma chamber, the extraction assembly comprising:
an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber,
wherein the high angle of incidence has a value between 45 degrees and 85 degrees.