US 11,948,702 B2
Radiation source apparatus and method for using the same
Wei-Chung Tu, Hsinchu (TW); Sheng-Kang Yu, Hsinchu (TW); Shang-Chieh Chien, Hsinchu (TW); Li-Jui Chen, Hsinchu (TW); and Heng-Hsin Liu, New Taipei (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on May 5, 2023, as Appl. No. 18/312,991.
Application 18/312,991 is a continuation of application No. 17/407,291, filed on Aug. 20, 2021, granted, now 11,694,820.
Claims priority of provisional application 63/185,612, filed on May 7, 2021.
Prior Publication US 2023/0274850 A1, Aug. 31, 2023
Int. Cl. G21K 1/06 (2006.01); G02B 5/08 (2006.01); G02B 5/10 (2006.01); G03F 7/00 (2006.01); H05G 2/00 (2006.01)
CPC G21K 1/06 (2013.01) [G02B 5/0808 (2013.01); G02B 5/0891 (2013.01); G02B 5/10 (2013.01); G03F 7/70025 (2013.01); G03F 7/70033 (2013.01); H05G 2/008 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A radiation source apparatus, comprising:
a vessel having an exit aperture;
a laser source configured to emit a laser beam to excite a target material to form a plasma;
a collector disposed in the vessel and configured to collect a radiation emitted by the plasma and to reflect the collected radiation to the exit aperture of the vessel;
a horizontal obscuration bar extending from a sidewall of the vessel at least to a position between the laser source and the exit aperture of the vessel; and
a reflective mirror in the vessel and connected to the horizontal obscuration bar.