CPC G06F 30/367 (2020.01) [G06F 30/398 (2020.01); H01L 22/20 (2013.01)] | 15 Claims |
1. A method for developing a semiconductor manufacturing process recipe, comprising:
selecting one or more device outcomes;
querying a hybrid model to obtain a process recipe recommendation suitable for obtaining the device outcomes, wherein the hybrid process model comprises:
a statistical model; and
a physical model, wherein the physical model is generated from a simulation of physical and chemical interactions within a processing tool across a plurality of different processing parameters;
executing a design of experiment (DoE) on a set of wafers to validate the process recipe recommended by the hybrid process model and to provide a validated process recipe;
applying the validated process recipe to a wafer;
executing the recipe on a plurality of first wafers;
obtaining wafer data from the plurality of first wafers;
obtaining process data from the processing tool relating to the execution of the recipe on the plurality of first wafers; and
providing the wafer data and the process data from the processing of the plurality of first wafers to the hybrid model to generate an updated hybrid model.
|