US 11,947,268 B2
Energy correction module for an optical source apparatus
Yingbo Zhao, San Diego, CA (US); and Md Hossain Toufiq Imam, San Diego, CA (US)
Assigned to Cymer, LLC, San Diego, CA (US)
Appl. No. 17/782,723
Filed by Cymer, LLC, San Diego, CA (US)
PCT Filed Dec. 2, 2020, PCT No. PCT/US2020/062820
§ 371(c)(1), (2) Date Jun. 6, 2022,
PCT Pub. No. WO2021/126527, PCT Pub. Date Jun. 24, 2021.
Claims priority of provisional application 63/055,563, filed on Jul. 23, 2020.
Claims priority of provisional application 62/949,721, filed on Dec. 18, 2019.
Prior Publication US 2023/0019832 A1, Jan. 19, 2023
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70558 (2013.01) [G03F 7/70025 (2013.01); G03F 7/70041 (2013.01); G03F 7/70308 (2013.01); G03F 7/70533 (2013.01); G03F 7/70575 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system for deep ultraviolet (DUV) optical lithography, the system comprising:
an optical source apparatus comprising N optical oscillators, wherein N is an integer number greater than or equal to two, and each of the N optical oscillators is configured to produce a pulse of light in response to an excitation signal; and
a control system coupled to the optical source apparatus, the control system configured to determine a corrected excitation signal for a first one of the N optical oscillators based on an input signal and an efficiency transfer function, the input signal comprising an energy property of a pulse of light produced by a second one of the N optical oscillators and the efficiency transfer function being associated with the second one of the N optical oscillators, wherein the efficiency transfer function relates excitation of the second one of the N optical oscillators with optical output of the second one of the N optical oscillators.