US 11,947,233 B2
Controlled randomization of electrochromic ablation patterns
Benjamin Treml, Northfield, MN (US); Jean-Christophe Giron, Edina, MN (US); Yigang Wang, Maple Grove, MN (US); and Robert Newcomb, Minneapolis, MN (US)
Assigned to SAGE Electrochromics, Inc., Fairbault, MN (US)
Filed by SAGE Electrochromics, Inc., Faribault, MN (US)
Filed on Dec. 28, 2020, as Appl. No. 17/135,739.
Claims priority of provisional application 62/922,240, filed on Dec. 30, 2019.
Prior Publication US 2021/0200052 A1, Jul. 1, 2021
Int. Cl. G02F 1/155 (2006.01); B23K 26/352 (2014.01); B23K 26/362 (2014.01); G02F 1/153 (2006.01)
CPC G02F 1/155 (2013.01) [G02F 1/1533 (2013.01); B23K 26/355 (2018.08); B23K 26/362 (2013.01)] 19 Claims
OG exemplary drawing
 
1. An electrochromic (EC) device, comprising:
an EC film stack; and
conductive layers, wherein:
at least one conductive layer of the conductive layers comprises surface grooves arranged according to a randomized groove pattern, the randomized groove pattern comprising a randomized variation in at least one geometrical characteristic of a plurality of open-loop non-intersecting segments from a non-randomized groove pattern, wherein the at least one geometrical characteristic comprises at least:
a directional orientation of an open-loop non-intersecting segment of the plurality of open-loop non-intersecting segments, wherein the open-loop non-intersecting segment of the plurality of open-loop non-intersecting segments has a shape that is one of a symmetrical sinusoid or linear between endpoints of the open-loop non-intersecting segment; and
the randomized groove pattern is configured to reduce at least one of diffraction or scatter of light incident on the surface grooves, relative to the non-randomized groove pattern that does not include the randomized variation.