CPC C23C 16/45555 (2013.01) [C23C 16/38 (2013.01); C23C 16/4408 (2013.01); C23C 16/45534 (2013.01); C23C 16/45553 (2013.01); H01M 10/0562 (2013.01); H01M 2300/0068 (2013.01)] | 14 Claims |
1. A method of forming a lithium boron coating comprising:
providing a substrate within an atomic layer deposition reactor; and
depositing a coating of lithium boron composite by an atomic layer deposition process including:
pulsing a lithium precursor comprising a lithium tertiary butoxide into the reactor;
purging the reactor of the lithium precursor;
pulsing a solution of a first boron precursor and a first co-reactant comprising an organic solvent;
purging the reactor of the first boron precursor and the first co-reactant; and
pulsing a solution of a second boron precursor, different from the first boron precursor, and a second co-reactant different from the first co-reactant;
wherein the second boron precursor comprises boron fluoride and the second co-reactant comprises at least one of HF or HF-pyridine, or the second boron precursor comprises boron sulfide and the second co-reactant comprises at least one of S or H2S.
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