| CPC B29C 64/393 (2017.08) [B29C 64/264 (2017.08); C25D 1/003 (2013.01); C25D 17/10 (2013.01); C25D 21/12 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12)] | 19 Claims |
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1. An electrochemical additive manufacturing system comprising:
a deposition power supply;
deposition control circuits, coupled to the deposition power supply;
an electrode array, comprising individually-addressable electrodes such that each of the individually-addressable electrodes is electrically coupled to one of the deposition control circuits;
a deposition electrode;
an electrode-position actuator configured to
(a) position the electrode array and the deposition electrode substantially parallel relative to each other in an initial relative position between the electrode array and the deposition electrode,
(b) using at least a linear translation, spatially translate the electrode array and the deposition electrode from the initial relative position between the electrode array and the deposition electrode to a shifted relative position between the electrode array and the deposition electrode; and
a system controller configured to (a) create an initial target map, comprising individual target currents, based on the initial relative position between the electrode array and the deposition electrode, and (b) create an updated target map by shifting the individual target currents of the initial target map using a spatial reference between the initial relative position and the shifted relative position, wherein each of the individual target currents corresponds to one of the individually-addressable electrodes, where the deposition control circuits are configured to control electric current through each of the individually-addressable electrodes based on a corresponding one of the individual target currents in the initial target map and the updated target map.
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