US 12,266,906 B2
Vertical cavity surface emitting device
Masaru Kuramoto, Tokyo (JP); and Seiichiro Kobayashi, Tokyo (JP)
Assigned to STANLEY ELECTRIC CO., LTD., Tokyo (JP)
Appl. No. 17/432,466
Filed by STANLEY ELECTRIC CO., LTD., Tokyo (JP)
PCT Filed Jan. 20, 2020, PCT No. PCT/JP2020/001693
§ 371(c)(1), (2) Date Aug. 19, 2021,
PCT Pub. No. WO2020/170675, PCT Pub. Date Aug. 27, 2020.
Claims priority of application No. 2019-029293 (JP), filed on Feb. 21, 2019.
Prior Publication US 2022/0149595 A1, May 12, 2022
Int. Cl. H01S 5/183 (2006.01)
CPC H01S 5/18361 (2013.01) 10 Claims
OG exemplary drawing
 
1. A vertical cavity surface emitting device comprising:
a substrate;
a first multilayer film reflecting mirror formed on the substrate;
a light-emitting structure layer formed on the first multilayer film reflecting mirror, the light-emitting structure layer including a light-emitting layer; and
a second multilayer film reflecting mirror formed on the light-emitting structure layer, the second multilayer film reflecting mirror constituting a resonator between the first multilayer film reflecting mirror and the second multilayer film reflecting mirror,
wherein:
the second multilayer film reflecting mirror includes a first multilayer film, an intermediate film, and a second multilayer film, the first multilayer film having low refractive index films made of a low refractive index material and high refractive index films made of a high refractive index material having a refractive index higher than a refractive index of the low refractive index material, the low refractive index films and the high refractive index films being alternately stacked, the intermediate film covering an upper surface of the first multilayer film, the intermediate film having a translucency to a light emitted from the light-emitting layer, the second multilayer film being formed to partially cover an upper surface of the intermediate film, the second multilayer film having the low refractive index films made of the low refractive index material and the high refractive index films made of the high refractive index material, and the low refractive index films and the high refractive index films being alternately stacked,
the intermediate film has a film thickness based on ½ of a wavelength inside the intermediate film of a light emitted from the light-emitting layer,
an upper surface of the second multilayer film and an area on the upper surface of the intermediate film where the second multilayer film is not formed are optically exposed, and
the high refractive index films, the low refractive index films, and the intermediate film are made of a dielectric film.