| CPC H01L 29/8083 (2013.01) [H01L 29/2003 (2013.01); H01L 29/7788 (2013.01); H01L 29/8122 (2013.01); H02M 3/158 (2013.01)] | 10 Claims |

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1. A nitride semiconductor device comprising:
a substrate;
a first nitride semiconductor layer above the substrate;
a first high-resistance layer above the first nitride semiconductor layer, the first high-resistance layer having a resistance higher than a resistance of the first nitride semiconductor layer;
a first p-type nitride semiconductor layer above the first high-resistance layer;
a first opening penetrating through the first p-type nitride semiconductor layer and the first high-resistance layer to the first nitride semiconductor layer;
an electron transport layer and an electron supply layer provided in stated order from a substrate side, the electron transport layer and the electron supply layer covering an upper portion of the first p-type nitride semiconductor layer and the first opening;
a gate electrode above the electron supply layer and covering the first opening;
a source electrode away from the gate electrode and in contact with the electron supply layer;
a second opening penetrating through the electron supply layer and the electron transport layer to the first p-type nitride semiconductor layer;
a potential fixing electrode in contact with the first p-type nitride semiconductor layer at a bottom part of the second opening; and
a drain electrode below the substrate.
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