US 12,266,547 B1
Cleaning system for semiconductor
Tianxiang Zhao, Jiangsu (CN); Shipin Yang, Jiangsu (CN); Shiyu Zhang, Jiangsu (CN); and Xianmiao Sun, Jiangsu (CN)
Assigned to Suzhou Zhicheng Semiconductor Technology Co., Ltd., Kunshan (CN)
Filed by Suzhou Zhicheng Semiconductor Technology Co., Ltd., Jiangsu (CN)
Filed on Dec. 26, 2024, as Appl. No. 19/002,655.
Claims priority of application No. 202410573131.2 (CN), filed on May 10, 2024.
Int. Cl. H01L 21/67 (2006.01)
CPC H01L 21/67051 (2013.01) 8 Claims
OG exemplary drawing
 
1. A cleaning system for a semiconductor, comprising:
a rotating mechanism, a liquid removing mechanism coaxially arranged on a circumferential outer side of the rotating mechanism, and a cavity mechanism arranged around an outer side of the liquid removing mechanism, wherein
the rotating mechanism comprises a carrier plate for holding a wafer in a horizontal posture and a transmission unit for driving the carrier plate to rotate axially;
the liquid removing mechanism comprises a hollow shaft driver sleeved on an outer side of the transmission unit and a liquid guiding ring annularly arranged on a circumferential outer side of the carrier plate and controlled by the hollow shaft driver to rotate along an axial direction, and a surface of the liquid guiding ring is convexly arranged upward along the axial direction to form at least one annular liquid blocking part;
the liquid removing mechanism further comprises a mounting seat arranged on the outer side of the transmission unit and supporting the hollow shaft driver, and an adapter ring arranged at a top end of the mounting seat along the axial direction and extending through the liquid guiding ring, wherein the adapter ring protrudes outward in a radial direction to form a shielding part extending through the annular liquid blocking part, and a surface of the shielding part is recessed to form a guiding surface for guiding cleaning waste liquid to flow to the liquid guiding ring; and
the cavity mechanism comprises an external recovery cavity, at least one internal recovery cavity coaxially arranged at the external recovery cavity, and a lifting assembly for driving the internal recovery cavity to move longitudinally relative to the external recovery cavity, to collect the cleaning waste liquid through the external recovery cavity and the internal recovery cavity in different cleaning modes.