US 12,266,522 B2
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
Kazuyuki Okuda, Toyama (JP); Syuzo Sakurai, Toyama (JP); Yasuhiro Inokuchi, Toyama (JP); and Masayoshi Minami, Toyama (JP)
Assigned to Kokusai Electric Corporation, Tokyo (JP)
Filed by Kokusai Electric Corporation, Tokyo (JP)
Filed on Jan. 19, 2024, as Appl. No. 18/417,555.
Application 18/417,555 is a continuation of application No. 17/744,380, filed on May 13, 2022, granted, now 11,915,927.
Application 17/744,380 is a continuation of application No. 16/787,896, filed on Feb. 11, 2020, granted, now 11,361,961, issued on Jun. 14, 2022.
Claims priority of application No. 2019-023380 (JP), filed on Feb. 13, 2019.
Prior Publication US 2024/0153760 A1, May 9, 2024
Int. Cl. H01L 21/02 (2006.01); C23C 16/34 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/50 (2006.01); C23C 16/52 (2006.01); H01J 37/32 (2006.01)
CPC H01L 21/0228 (2013.01) [C23C 16/345 (2013.01); C23C 16/4412 (2013.01); C23C 16/4583 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); H01J 37/32449 (2013.01); H01J 37/32715 (2013.01); H01J 37/32834 (2013.01); H01L 21/0217 (2013.01); H01L 21/02274 (2013.01); H01J 37/32541 (2013.01); H01J 2237/3321 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A substrate processing apparatus comprising:
a process chamber in which a substrate is capable of being accommodated; and
a gas supply system configured to supply a first process gas into the process chamber,
wherein the gas supply system comprises:
a first gas supply port configured to supply the first process gas to the substrate from an outer periphery of the substrate along a first supply direction;
a second gas supply port configured to supply the first process gas to the substrate from the outer periphery of the substrate along a second supply direction more inclined toward a tangential direction of the substrate from the second gas supply port than a direction parallel to the first supply direction; and
a storage part configured to temporarily store the first process gas to be supplied to at least one of the first gas supply port or the second gas supply port.