US 12,265,337 B2
Exposure apparatus
Junichi Kanehara, Eindhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Jul. 28, 2021, as Appl. No. 17/386,726.
Application 17/386,726 is a continuation of application No. 16/479,381, granted, now 11,092,903, previously published as PCT/EP2018/052211, filed on Jan. 30, 2018.
Claims priority of application No. 17154551 (EP), filed on Feb. 3, 2017; application No. 17169025 (EP), filed on May 2, 2017; application No. 17193990 (EP), filed on Sep. 29, 2017; and application No. 17201092 (EP), filed on Nov. 10, 2017.
Prior Publication US 2021/0356876 A1, Nov. 18, 2021
Int. Cl. G03F 9/00 (2006.01); G03F 7/00 (2006.01)
CPC G03F 9/7046 (2013.01) [G03F 7/70341 (2013.01); G03F 7/70491 (2013.01); G03F 7/706 (2013.01)] 20 Claims
OG exemplary drawing
 
16. An apparatus for an exposure tool configured to project a radiation beam onto a target portion of a substrate, the apparatus comprising:
a movable first substrate holder configured to hold the substrate, the first substrate holder comprising an upper surface to directly contact the substrate;
a movable second substrate holder configured to hold the substrate;
a sensor holder configured to hold a sensor and/or a detector configured to receive the radiation beam; and
a movement device configured to lift the substrate up and out of direct contact with the upper surface of the first substrate holder and transfer the substrate to the second substrate holder without an intermediate placement of the substrate on another surface between movement of the substrate from the first substrate holder to the second substrate holder.