US 12,265,335 B2
Alignment-overlay mark and method using the same
Kazuko Yamashita, Hiroshima (JP); and Toshiharu Nishiyama, Hiroshima (JP)
Assigned to Micron Technology, Inc., Boise, ID (US)
Filed by MICRON TECHNOLOGY, INC., Boise, ID (US)
Filed on Sep. 21, 2022, as Appl. No. 17/933,968.
Prior Publication US 2024/0096813 A1, Mar. 21, 2024
Int. Cl. G03F 7/00 (2006.01); G03F 9/00 (2006.01)
CPC G03F 7/70683 (2013.01) [G03F 7/70633 (2013.01); G03F 9/7046 (2013.01); G03F 9/7076 (2013.01)] 11 Claims
OG exemplary drawing
 
1. An alignment-overlay mark, comprising:
a pair of first marks extending in a first direction and arranged in parallel to each other in a second direction, the second direction perpendicular to the first direction, wherein each of the first marks includes a plurality of first bars extending in the first direction and arranged in parallel to each other in the second direction; and
a plurality of second marks between the first marks, the second marks extending in the second direction and arranged in parallel to each other in the first direction, wherein each of the second marks includes a plurality of second bars extending in the second direction and arranged in parallel to each other in the first direction, wherein
a width of each of the first marks in the second direction is the same as a length of each of the second marks in the first direction,
a gap length between neighboring second marks of the plurality of second marks in the first direction is the same as the length of each of the second marks in the first direction, and
a length of the alignment-overlay mark in the first direction is the same as a length of each of the first marks in the first direction, a width of the alignment-overlay mark in the second direction is the same as a width of the pair of the first marks in the second direction, and the length of the alignment-overlay mark in the first direction is greater than the width of the alignment-overlay mark in the second direction.