US 12,265,329 B2
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
Kotaro Takahashi, Haibara-gun (JP); Yasunori Yonekuta, Haibara-gun (JP); and Taro Miyoshi, Haibara-gun (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Aug. 4, 2021, as Appl. No. 17/393,889.
Application 17/393,889 is a continuation of application No. PCT/JP2020/008780, filed on Mar. 3, 2020.
Claims priority of application No. 2019-063688 (JP), filed on Mar. 28, 2019.
Prior Publication US 2021/0373438 A1, Dec. 2, 2021
Int. Cl. G03F 7/004 (2006.01); C07D 235/18 (2006.01); C07D 263/57 (2006.01); C07D 277/66 (2006.01); C08F 212/14 (2006.01)
CPC G03F 7/0045 (2013.01) [C07D 235/18 (2013.01); C07D 263/57 (2013.01); C07D 277/66 (2013.01); C08F 212/24 (2020.02)] 5 Claims
 
1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
a resin having a solubility in a developer, which changes by an action of an acid;
a compound that generates an acid upon irradiation with actinic rays or radiation; and
an acid diffusion control agent,
wherein a molecular weight of the acid diffusion control agent is 420 or more,
a distance Ra between a Hansen solubility parameter of the acid diffusion control agent and a Hansen solubility parameter of air is from 15 MPa0.5 to 45 MPa0.5, and
the acid diffusion control agent is a compound represented by General Formula (Q-1),

OG Complex Work Unit Chemistry
in General Formula (Q-1),
Rq1 and Rq2 each independently represents a substituent,
Xq represents —NH—, —S—, or —O—,
in a case where Xq represents —NH—, the compound represented by General Formula (Q-1) is a compound represented by General Formula (Q11),

OG Complex Work Unit Chemistry
in General Formula (Q 11),
Rq11 and Rq12 each independently represents an alkyl group or an aryl group, and
Lq1 and Lq2 each independently represents a single bond, or —O—, —(C═O)—, an alkylene group, or a divalent linking group formed by combination of these groups, and
in a case where Xq represents —S— or —O—,
mq represents an integer of 0 to 5, in a case where mq is 2 or more, a plurality of Rq1's may be the same as or different from each other, and in a case where mq is 2 or more, the plurality of Rq1's may be bonded to each other to form a ring structure, and
nq represents an integer of 0 to 4, in a case where nq is 2 or more, a plurality of Rq2's may be the same as or different from each other, and in a case where nq is 2 or more, the plurality of Rq2's may be bonded to each other to form a ring structure.