US 12,265,239 B2
Wide angle application high reflective mirror
Li Wu, Fujian (CN); Zhe Liu, Fujian (CN); Guanglong Yu, Fujian (CN); Yu Li, Fujian (CN); Yan Su, Fujian (CN); and Zhiqiang Lin, Fujian (CN)
Assigned to II-VI DELAWARE, INC., Wilmington, DE (US)
Appl. No. 17/259,439
Filed by II-VI DELAWARE, INC., Wilmington, DE (US)
PCT Filed Sep. 12, 2018, PCT No. PCT/CN2018/105140
§ 371(c)(1), (2) Date Aug. 2, 2021,
PCT Pub. No. WO2020/015101, PCT Pub. Date Jan. 23, 2020.
Claims priority of application No. 201810792202.2 (CN), filed on Jul. 18, 2018.
Prior Publication US 2021/0356633 A1, Nov. 18, 2021
Int. Cl. G02B 5/08 (2006.01); G02B 1/10 (2015.01)
CPC G02B 5/0875 (2013.01) [G02B 1/10 (2013.01); G02B 5/0883 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A wide angle application high reflective mirror having a reflection band partially overlapping in a wavelength range of 800 to 4000 nm, wherein the high reflective mirror comprises:
a plurality of high refractive index film layers and a plurality of low refractive index film layers alternately stacked, a material of the high refractive index film layers includes one of (i) SiOxHy or SiOxNy, or (ii) a mixture at least two of SiH, SiOxHy, or SiOxNy
wherein each of the plurality of high refractive index film layers has a refractive index of greater than 3 in the wavelength range of 800 to 4000 nm and the reflection band has a reflectance of greater than 99% within the wavelength range of 850 to 950 nm with an incident angle ranging from 0 to 60 degrees over a large angle range.