| CPC G02B 27/0927 (2013.01) [G02B 27/0944 (2013.01); G02B 27/0994 (2013.01)] | 11 Claims |

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1. A pupil shaping arrangement for obtaining a defined pupil intensity profile for a metrology illumination beam configured for use in a metrology application, the pupil shaping arrangement comprising:
an engineered diffuser having a defined far-field profile configured to impose the defined pupil intensity profile on the metrology illumination beam; and
a multimode fiber located between the engineered diffuser and an output of the pupil shaping arrangement;
wherein the engineered diffuser is configured to impose the pupil intensity profile on an input pupil of the multimode fiber that is greater at a periphery of the input pupil with respect to an inner region of the input pupil.
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