US 12,265,203 B2
Antireflective member, and polarizing plate, image display device and antireflective article each equipped with same
Tatsuya Kozakai, Okayama (JP); Tomoyuki Horio, Tsukuba (JP); Michiaki Takei, Okayama (JP); Osamu Watanabe, Okayama (JP); Keisuke Endou, Kashiwa (JP); Takanobu Tadaki, Tsukuba (JP); Kio Mizuno, Kuki (JP); Atsushi Washio, Tsukuba (JP); Keita Iwahara, Okayama (JP); and Sho Suzuki, Okayama (JP)
Assigned to DAI NIPPON PRINTING CO., LTD., Tokyo (JP)
Appl. No. 17/420,943
Filed by DAI NIPPON PRINTING CO., LTD., Tokyo (JP)
PCT Filed Jan. 10, 2020, PCT No. PCT/JP2020/000590
§ 371(c)(1), (2) Date Jul. 6, 2021,
PCT Pub. No. WO2020/145373, PCT Pub. Date Jul. 16, 2020.
Claims priority of application No. 2019-002904 (JP), filed on Jan. 10, 2019; and application No. 2019-067731 (JP), filed on Mar. 29, 2019.
Prior Publication US 2022/0091303 A1, Mar. 24, 2022
Int. Cl. G02B 1/111 (2015.01); G02B 5/30 (2006.01)
CPC G02B 1/111 (2013.01) [G02B 5/3025 (2013.01)] 11 Claims
OG exemplary drawing
 
1. An antireflection member comprising a low refractive index layer on a transparent substrate, wherein
the low refractive index layer comprises a binder resin and silica particles,
the binder resin comprises a cured product of an ionizing radiation-curable resin composition and the ionizing radiation-curable resin composition contains an alkylene oxide-modified (meth)acrylate-based compound,
the silica particles include hollow silica particles and non-hollow silica particles, and a content of the non-hollow silica particles is 90 parts by mass or more and 200 parts by mass or less based on 100 parts by mass of the binder resin,
a ratio of Si element attributed to the silica particles, obtained by analysis of a surface region of the low refractive index layer by X-ray photoelectron spectroscopy, is 10.0 atomic percent or more and 18.0 atomic percent or less and a ratio of C element under the assumption that the ratio of Si element is defined to be 100 atomic percent is 180 atomic percent or more and 500 atomic percent or less, and
when the thickness of the low refractive index layer is trisected and regions obtained are defined as a first region, a second region and a third region sequentially closer to the transparent substrate, at an arbitrary point in the first region and an arbitrary point in the second region, the ratio of Si element attributed to the silica particles is 10.0 atomic percent or more and 18.0 atomic percent or less and the ratio of C element under the assumption that the ratio of Si element is defined to be 100 atomic percent is 180 atomic percent or more and 500 atomic percent or less.