CPC G01N 27/4145 (2013.01) [H01L 21/3065 (2013.01); H01L 29/1606 (2013.01); H01L 29/66045 (2013.01)] | 14 Claims |
1. A method of forming a material on a graphene layer structure for injecting charge into, or extracting charge out of, the graphene layer structure, the method comprising:
providing a graphene layer structure having one or more first portions on a non-metallic substrate, said one or more first portions having one or more surface defects comprising excess out-of-plane material;
plasma etching the one or more first portions of the graphene layer structure to remove the out-of-plane material;
depositing a material for injecting charge into, or extracting charge out of, the graphene layer structure onto the one or more plasma-etched first portions.
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