US 12,264,909 B2
Type of device(s) for automatically monitoring a coating and/or structure applied to a substrate with determination of reflective properties and/or geometric dimensions, and a corresponding method
Bernhard Gruber, Stockdorf (DE)
Assigned to QUISS QUALITAETS-INSPEKTIONSSYSTEME UND SERVICE GMBH, Puchheim (DE)
Appl. No. 17/914,284
Filed by QUISS QUALITAETS-INSPEKTIONSSYSTEME UND SERVICE GMBH, Puchheim (DE)
PCT Filed Mar. 25, 2021, PCT No. PCT/EP2021/057774
§ 371(c)(1), (2) Date Sep. 23, 2022,
PCT Pub. No. WO2021/191363, PCT Pub. Date Sep. 30, 2021.
Claims priority of application No. 102020203850.3 (DE), filed on Mar. 25, 2020.
Prior Publication US 2023/0349692 A1, Nov. 2, 2023
Int. Cl. G01B 11/25 (2006.01); G01N 21/17 (2006.01); G01N 21/41 (2006.01); G01N 21/55 (2014.01); G01N 21/88 (2006.01)
CPC G01B 11/25 (2013.01) [G01N 21/17 (2013.01); G01N 21/41 (2013.01); G01N 21/55 (2013.01); G01N 21/8851 (2013.01); G01N 2021/1765 (2013.01); G01N 2021/4153 (2013.01); G01N 2021/8887 (2013.01)] 19 Claims
OG exemplary drawing
 
1. An analysis device for optically monitoring at least two material applications, which can be applied or produced on a substrate, in one working step, wherein the material applications include at least a first material application and a second material application, wherein an analysis of the first material application can be effected in advance of the second material application being applied to the substrate by a material application element, and wherein an analysis of the second material application can be effected after the second material application by the material application element, the analysis device comprising:
a first radiation source and detection device assembly, the first radiation source and detection device assembly comprising at least a first radiation source for projecting at least one light line onto the first material application member, and a first optical detection device associated with the first radiation source for detecting the at least one light line and for generating first image data,
wherein the first image data represents the detected at least one light line,
and
a second radiation source and detection device assembly, wherein the second radiation source and detection device assembly comprises at least a second radiation source for projecting at least one further light line onto the second material application and a second optical detection device associated with the second radiation source for detecting the at least one further light line and for generating second image data,
the second image data representing the detected at least one further light line,
wherein the first image data represents a physical parameter of the at least one light line detected by the first optical detection device, and
wherein the second image data represents a geometric parameter of the at least one further light line detected by the second optical detection device,
wherein the first radiation source and detection device assembly and the second radiation source and detection device assembly are identical in construction,
processing means for processing the first image data generated by the first optical detection device and the second image data generated by the second optical detection device, and
control means for driving the first radiation source and detection device assembly and for driving the second radiation source and detection device assembly,
wherein the control means, in dependence on relative positions of the individual radiation source and detection device assemblies for the first and/or second material application, is configured to initiate a re-registration of one of the radiation source and detection device assemblies as a first radiation source and detection device assembly and a re-registration of one of the remaining radiation source and detection device assemblies as a second radiation source and detection device assembly.