US 12,264,878 B2
RF treatment systems and methods
Hon Ming Chun, Lexington, MA (US); Parastoo Yaghmaee, Davis, CA (US); Nathanial G. Smalley, Cedar Rapids, IA (US); and Zakiul Kabir, Portland, OR (US)
Assigned to ZIEL EQUIPMENT, SALES AND SERVICES, INC., San Francisco, CA (US)
Filed by Ziel Equipment, Sales and Services, Inc., San Francisco, CA (US)
Filed on Aug. 20, 2021, as Appl. No. 17/445,579.
Claims priority of provisional application 63/068,852, filed on Aug. 21, 2020.
Prior Publication US 2022/0061134 A1, Feb. 24, 2022
Int. Cl. H05B 6/68 (2006.01); F26B 3/30 (2006.01); H05B 6/54 (2006.01); H05B 6/64 (2006.01); H05B 6/80 (2006.01)
CPC F26B 3/30 (2013.01) [H05B 6/54 (2013.01); H05B 6/6455 (2013.01); H05B 6/68 (2013.01); H05B 6/80 (2013.01)] 4 Claims
OG exemplary drawing
 
1. A method comprising:
during an RF treatment,
heating product positioned in a container via application of RF power until a target temperature is reached, wherein the container and the product are positioned within an RF chamber; then
varying the application of the RF power within the RF chamber via feedback control;
determining a temperature spread is greater than a threshold based on output from one or more temperature sensors positioned in the container; and
pausing the application of the RF power responsive to the temperature spread being greater than the threshold,
wherein the temperature spread is a difference between a maximum temperature reading and a minimum temperature reading for the product at a same point in time.